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China Rare Metal Material Co.,Limited
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Rare Earth Sputtering Target
Lanthanum (La),Cerium (Ce),Praseodymium (Pr),Neodymium (Nd),Samarium (Sm),Europium (Eu),Gadolinium (Gd),Terbium (Tb),Dysprosium (Dy),Holmium (Ho),Erbium (Er),Thulium (Tm),Ytterbium (Yb),Lutetium (Lu) ,Scandium (Sc),Yttrium (Y)
Metal Sputtering Targets
Aluminum (Al),Antimony (Sb),Bismuth (Bi) ,Boron (B) ,Cadmium (Cd) ,Carbon (C),Cerium (Ce) ,Chromium (Cr) ,Cobalt (Co) ，Copper (Cu) ，Dysprosium (Dy)，Erbium (Er)，Europium (Eu)，Gadolinium (Gd)，Germanium (Ge) ，Gold (Au) ，Graphite (C)，Hafnium (Hf)，Holmium (Ho)，Indium (In) ，Iridium (Ir) ，Iron (Fe) ，Lanthanum (La)，Lutetium (Lu) ，Magnesium (Mg)，Manganese (Mn)，Molybdenum (Mo) ，Neodymium (Nd)，Nickel (Ni)，Niobium (Nb)，Palladium (Pd)， Platinum (Pt) ，Praseodymium (Pr)，Rhenium (Re) ，Ruthenium (Ru) ，Samarium (Sm)，Selenium (Se) ，Scandium (Sc)，Silver (Ag)，Silicon (Si) ，Tantalum (Ta)，Terbium (Tb)，Thulium (Tm)，Tin (Sn)，Titanium (Ti)，Tungsten (W)，Vanadium (V) ，Ytterbium (Yb)，
Yttrium (Y)，Zirconium (Zr)，Zinc (Zn)
Alloy Sputtering Targets
Aluminum Copper (Al-Cu)，Aluminum Chromium (Al-Cr)，Aluminum Magnesium(Al-Mg)，Aluminum Silicon (Al-Si)，Aluminum Silver (Al-Ag)，Cerium Gadolinium (Ce-Gd)，Cerium Samarium (Ce-Sm)，Chromium Silicon (Cr-Si)，Cobalt Chromium (Co-Cr)，Cobalt Iron (Co-Fe)，Cobalt Iron Boron (Co-Fe-B) ，Copper Cobalt (Cu/Co) ，Copper Gallium (Cu-Ga)，Copper Indium (CuIn)，Copper Nickel (Cu-Ni)，Copper Zirconium (Cu-Zr) ，Hafnium Iron (HfFe)，Iron Boron (Fe-B)，Iron Carbon (Fe-C) ，Iron Manganese (Fe-Mn)，Iridium Manganese (Ir-Mn) ，Iridium Rhenium (Ir-Re)，Indium Tin (In-Sn)，Molybdenum Silicon (Mo-Si)，Nickel Aluminum (Ni-Al)，Nickel-Chromium (Ni-Cr)，Nickel-Chromium Silicon (Ni-Cr-Si)，Nickel-Iron (Ni-Fe)，Nickel Niobium Titanium (NiNbTi) ，Nickel-Titanium (Ni-Ti)，Nickel-Vanadium (Ni-V)，Samarium Cobalt (Sm-Co) Silver Copper (Ag-Cu)，Silver Tin (Ag-Sn) ，Tantalum Aluminum (Ta-Al)，Terbium Dysprosium Iron (TbDyFe)，Terbium Iron Alloy (TbFe)，Titanium Aluminum (Ti-Al)，Titanium Nickel (Ti-Ni)，Titanium Chromium (TiCr)，Tungsten-Rhenium (WRe) ，Tungsten Titanium (WTi)，Zirconium Aluminum (Zr-Al) ，Zirconium Iron (Zr-Fe) ，Zirconium Nickel (Zr-Ni)，Zirconium Niobium (Zr-Nb)，Zirconium Titanium (Zr-Ti)，Zirconium Yttrium (Zr-Y) ，Zinc Aluminum (ZnAl)，Zinc Magnesium (ZnMg)
Boride Sputtering Targets
Chromium Boride (Cr2B),Chromium Boride (CrB),Chromium Boride (CrB2),Chromium Boride (Cr5B3), Iron Boride (FeB),Hafnium Boride (HfB2),Lanthanum Boride (LaB6),Molybdenum Boride (Mo2B),Molybdenum Boride (Mo2B5),Niobium Boride (NbB),Niobium Boride (NbB2),Tantalum Boride (TaB),Tantalum Boride (TaB2),Titanium Boride (TiB2),Tungsten Boride (W2B),Tungsten Boride (WB),Vanadium Boride (VB),Vanadium Boride (VB2),Zirconium Boride (ZrB2)
Carbide Sputtering Targets
Boron Carbide (B4C),Chromium Carbide (Cr3C2),Hafnium Carbide (HfC),Molybdenum Carbide (Mo2C),Niobium Carbide (NbC),Silicon Carbide (SiC),Tantalum Carbide (TaC),Titanium Carbide (TiC),Tungsten Carbide (WC),Tungsten Carbide (W2C),Vanadium Carbide (VC),Zirconium Carbide (ZrC)
Fluoride Sputtering Targets
Aluminium Fluoride (AlF3) ,Barium Fluoride (BaF3) ,Cadmium Fluoride (CdF2), Calcium Fluoride (CaF2) , Cerium Fluoride (CeF3) , Dysprosium Fluoride (DyF3) ,Erbium Fluoride (ErF3) ,Hafnium Fluoride (HfF4),Kalium Fluoride (KF) ,Lanthanum Fluoride (LaF3)
Lead Fluoride (PbF2),Lithium Fluoride (LiF), Praseodymium Fluoride (PrF3), Magnesium Fluoride (MgF2) , Neodymium Fluoride (NdF3) , Rare Earth Fluoride (ReF3) ,Samarium Fluoride (SmF3) ,
Sodium Fluoride (NaF) ,Sodium Aluminum Fluoride (Cryolite) Na3AlF6 ,Strontium Fluoride (SrF2) ,Thorium Fluoride (ThF4),Yttrium Fluoride (YF3) ,Ytterbium Fluoride (YbF3)
Nitrides Sputtering Targets
Aluminum Nitride (AlN), Boron Nitride (BN),Gallium Nitirde(GaN), Hafnium Nitride (HfN), Niobium Nitride (NbN), Silicon Nitride (Si3N4), Tantalum Nitride (TaN), Titanium Nitride (TiN), Vanadium Nitride (VN), Zirconium Nitride (ZrN)
Oxide Sputtering Targets
Aluminum Oxide (Al2O3), Antimony Oxide (Sb2O3)，Antimony Tin Oxide (ATO)，Barium Titanate (BaTiO3)，Bismuth Oxide (Bi2O3)，Cerium Oxide (CeO2)，Copper Oxide (CuO)，Chromium Oxide (Cr2O3) ，Dysprosium Oxide (Dy2O3)，Erbium Oxide (Er2O3)，Europium Oxide (Eu2O3)，Gadolinium Oxide (Gd2O3)，Gallium Oxide (Ga2O3)，Germanium Oxide (GeO2)，Hafnium Oxide (HfO2) ，Holmium Oxide (Ho2O3)，Indium Oxide (In2O3)，Indium Tin Oxide (ITO) ，Iron Oxide (Fe2O3) ，Iron Oxide (Fe3O4)，Lanthanum Oxide (La2O3)，Lead Titanate (PbTiO3)，Lead Zirconate (Pb ZrO3)，Lithium Niobate (LiNbO3)， Lutetium Iron Oxide (Lu3Fe5O12)，Lutetium Oxide (Lu2O3)，Magnesium Oxide (MgO)，Molybdenum Oxide (MoO3)，Neodymium Oxide (Nd2O3)，Praseodymium Oxide (Pr6O11)，Praseodymium Titanate (Pr(TiO2)2)，Praseodymium Oxide (Pr2O3)，Samarium Oxide (Sm2O3)，Scandium Oxide (Sc2O3)，Silicon Dioxide (SiO2) ，Silicon Monoxide (SiO)，Strontium Titanate (SrTiO3)，Strontium Zirconate (SrZrO3)，Tantalum Pentoxide (Ta2O5)，Terbium Oxide (Tb4O7)，Tellurium Oxide (TeO2)，Thorium Oxide (ThO2)，Thulium Oxide (Tm2O3)，Titanium Dioxide (TiO2)，Titanium Monoxide (TiO)，Titanium Pentoxide (Ti3O5)，Titanium Trioxide (Ti2O3)，Tin Dioxide (SnO2)，Tin Monoxide (SnO)，Tungsten oxide (WO3)，Vanadium Pentoxide (V2O5)，Yttrium Aluminum Oxide (YAG)Y3Al5O12，Ytterbium Oxide (Yb2O3)，Yttrium Oxide (Y2O3)， Zinc Oxide (ZnO) ，Zinc Aluminum Oxide (ZnO:Al)，Zirconium Oxide (ZrO2) (unstabilized)，Zirconium Oxide (ZrO2-5-15wt%CaO)
Selenides Sputtering Targets
Bismuth Selenide (Bi2Se3)，Cadmium Selenide (CdSe)，Indium Selenide (In2Se3)，Lead Selenide (PbSe)，Molybdenum Selenide (MoSe2)，Niobium Selenide (NbSe2)，Tantalum Selenide (TaSe2)，Tungsten Selenide (WSe2)，Zinc Selenide (ZnSe)
Silicides Sputtering Targets
Chromium Silicide (Cr3Si)，Chromium Silicide (CrSi2)，Cobalt Silicide(CoSi2), Hafnium Silicide (HfSi2)，Molybdenum Silicide (MoSi2)，Niobium Silicide (NbSi2)，Tantalum Silicide (TaSi2)，Tantalum Silicide (Ta5Si3)，Titanium Silicide (TiSi2)，Titanium Silicide (Ti5Si3)，Tungsten Silicide (WSi2)，Vanadium Silicide (V3Si)，Vanadium Silicide (VSi2)，Zirconium Silicide (ZrSi2)
Sulfides Sputtering Targets
Antimony Sulfide (Sb2S3) ，Arsenic Sulfide (As2S3)，Cadmium Sulphide ( CdS)，Iron Sulfide (FeS)，Lead Sulfide (PbS)，Molybdenum Sulfide (MoS2)，Niobium Sulfide (NbS1.75)，Tantalum Sulfide (TaS2)，Tungsten Sulfide(WS2)，Zinc Sulphide (ZnS) ，
Tellurides Sputtering Targets
Cadmium Telluride (CdTe)，Lead Telluride (PbTe)，Molydenum Telluride (MoTe2)，Niobium Telluride (NbTe2)，Tantalum Telluride (TaTe2)，Tungsten Telluride (WTe2)，Zinc Telluride (ZnTe)
Other
Cr-SiO ,
Substrate
China Rare Metal Material Co., Limited supply many kinds of excellent Crystal wafer as sputtering targets and substrate.
Substrate
Aluminum Oxide (Al2O3,Sapphire,Ruby)，Silicon (Si) ，Barium Fluoride (BaF2)，Silicon Oxide(SiO2,Quartz)，Calcium Fluoride (CaF2)， Strontium Titanate (SrTiO3)， Gallium Arsenide ( GaAs) ，Yttria-stabilized zirconia (YSZ )，Gallium Phosphide (GaP)，Lithium Niobate (LiNbO3)，Germanium (Ge) ，Lithium Tantalate (LiTaO3)，Indium Phosphide (InP)，Magnesium Oxide(MgO)，Lanthanum Aluminate (LaAlO3)，Magnesium fluoride ( MgF2), YAG, Glass, Zinc, Selenide, Zinc Sulphide,
Purity: 99%, 99.9%,99.95% 99.99%,99.995% 99.999% and 99.9999%.
Shape: foil, sheet, wire, filament, rod, pipe, tube, powder, pellet, shot, wafer, plate, tablet, ingot, chunk, lump, granule, dendritic, crystal, and base on your drawing.
Dimension: Diameter (<500mm), Length (<1000mm), Width (<500mm), Thickness (>1mm), Custom-Made
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