There are 3 set HIP machine in China rare metal material co.,ltd. We could sure the quantity of month will be about 10mt . About Chromium, We could supply three purity of Cr target, include 99.5%, 99.9%,99.95%. No shrinking generating and no bending of target.
Speciafication:
Shape: sheet, rod, plate(with screw), disk
Surface: Precision Grind
Density: >99.9%
Limit size: Diameter <350mm, With< 350, Length< 650mm
Manufacture by HIP, there are many kinds of sputtering target, include ITO target, Chromium Silicon alloy sputtering target (CrSi target ), Chromium Aluminium sputtering target (CrAl target), Titanium Aluminium sputtering target ( TiAl target ), Chromium Tungstem sputtering target ( CrW target), Tungstem Titanium sputtering target ( WTi alloy target).
Sputtering Targets Sputtering materials for the applications to magnetic disk and head, magneto optical disk, optical disk, superconducting thin film, protective film.
Metal Sputtering Targets (include Rare Earth metal Sputtering Target):
Al,Sb,Bi ,B ,Cd ,C,Ce ,Cr ,Co ,Cu ,Dy,Er,Eu,Gd,Ge ,Au ,C,Hf,Ho,In ,Ir ,Fe ,La,Lu ,Mg,Mn,Mo ,Nd,Ni,Nb,Pd,Pt ,Pr,Re ,Ru ,Sm,Se ,Sc,Ag,Si ,Ta,Tb,Tm,Sn,Ti,W,V ,Yb,Y,Zr,Zn,La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu , Sc, Y
Alloy Sputtering Targets: AlCu,AlCr,AlMg,AlSi,AlSiCu, AlAg,AlV, CaNiCrFe, CaNiCrFeMoMn, CeGd,CeSm,CrSi,CoCr, CoCrMo, CoFe,CoFeB,CoNi, CoNiCr, CoPt, CoNbZr, CoTaZr, CoZr, CrV, CrB, CrSi, CrCu, CuCo ,CuGa,CuIn,CuNi,CoNiPt, CuZr,DyFe, DyFeCo, FeB,FeC,FeMn,GdFe, GdFeCo, HfFe,IrMn,IrRe,InSn,MoSi,NiAl,NiCr,NiCrSi,NdDyFeCo, NiFe,NiMn, NiNbTi ,NiTi,NiV,SmCo, AgCu,AgSn,TaAl,TbDyFe,TbFe,TbFeCo, TbGdFeCo, TiAl,TiNi,TiCr,WRe ,WTi,WCu, ZrAl,ZrCu, ZrFe ,ZrNb,ZrNi,ZrTi,ZrY ,ZnAl,ZnMg
Ceramic Sputtering Targets :
Boride Sputtering Targets Cr2B,CrB,CrB2,Cr5B3, FeB,HfB2,LaB6,Mo2B,Mo2B5,NbB,NbB2,TaB,TaB2,TiB2,W2B,WB,VB,VB2,ZrB2
Carbide Sputtering Targets : B4C,Cr3C2,HfC,Mo2C,NbC,SiC,TaC,TiC,WC,W2C,VC,ZrC
Fluoride Sputtering Targets : AlF3, BaF3, CdF2, CaF2, CeF3, DyF3, ErF3, HfF4, KF, LaF3, PbF2, LiF, PrF3, MgF2, NdF3, ReF3, SmF3, NaF, Cryolite, Na3AlF6 , SrF2, ThF4, YF3, YbF3
Nitrides Sputtering Targets : AlN, BN,GaN, HfN, NbN, Si3N4, TaN, TiN, VN, ZrN
Oxide Sputtering targets : Al2O3,Sb2O3,ATO,BaTiO3,Bi2O3,CeO2,CuO,Cr2O3 ,Dy2O3,Er2O3,Eu2O3,Gd2O3,Ga2O3,GeO2,HfO2 ,Ho2O3,In2O3,ITO,Fe2O3,Fe3O4,La2O3,PbTiO3,PbZrO3,LiNbO3,Lu3Fe5O12,Lu2O3,MgO,MoO3,Nd2O3,Pr6O11,Pr(TiO2)2,Pr2O3,Sm2O3,Sc2O3,SiO2,SiO,SrTiO3,SrZrO3,Ta2O5,Tb4O7,TeO2,ThO2,Tm2O3,TiO2,TiO,Ti3O5,Ti2O3,SnO2,SnO,WO3,V2O5,YAG, Y3Al5O12,Yb2O3,Y2O3,ZnO,ZnO:Al,ZrO2(unstabilized),ZrO2-5-15wt%CaO)
Selenides Sputtering Targets : Bi2Se3,CdSe,In2Se3,PbSe,MoSe2,NbSe2,TaSe2,WSe2,ZnSe
Silicides Sputtering Targets : Cr3Si,CrSi2,CoSi2, HfSi2,MoSi2,NbSi2,TaSi2,Ta5Si3,TiSi2,Ti5Si3,WSi2,V3Si,VSi2,ZrSi2
Sulfides Sputtering Targets : Sb2S3 ,As2S3,CdS,FeS,PbS,MoS2,NbS1.75,TaS2,WS2,ZnS,
Tellurides Sputtering Targets : CdTe,PbTe,MoTe2,NbTe2,TaTe2,WTe2,ZnTe
Other : Cr-SiO ,GaAs , Ga-P, In-Sb , InAs, InP, InSn,
Purity: 99%, 99.9%,99.95% 99.99%,99.995% 99.999% and 99.9999%.
Shape: foil, sheet, rod, pipe, tube, ring, wafer, plate, tablet and base on your drawing. disk, rectangle, band, rod and other shapes
Dimension: Diameter (<650mm), Length (<1600mm), Width (<500mm), Thickness (>1mm), Custom-Made
Others on request!
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